Trace metal analysis

Trace element analysis using Triple Quadrupole (ICP-QQQ), which can be analysis for UPW, ultra-pure acid, alkali, organic solvent, etching solution, etc., and wafer surface extraction acid solution. Detection limit to ppq level

Application :
Chemicals quality control
Developer, etching solution, photoresist, UPW ; process contamination: semiconductor etching process, production process section (measurement of trace metals in air); residual wafer surface; quality control of chemical plant production (such as process specific chemicals)

Process special chemicals